Surface figure measurement of flat mirrors based on the subaperture
stitching interferometry

Pengqian Yang; Stefan Hippler; Zhaojun Yan; Rainer Lenzen; Wolfgang Brandner; Casey Deen; Thomas Henning; Armin Huber; Sarah Kendrew; Jianqiang Zhu

doi:10.1117/12.974568

15 October 2012 Surface figure measurement of flat mirrors based on the subaperture stitching interferometry

Pengqian Yang, Stefan Hippler, Zhaojun Yan, Rainer Lenzen, Wolfgang Brandner, Casey Deen, Thomas Henning, Armin Huber, Sarah Kendrew, Jianqiang Zhu

Author Affiliations +

Proceedings Volume 8417, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment; 841723 (2012) https://doi.org/10.1117/12.974568
Event: 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT 2012), 2012, Xiamen, China

Abstract

Large flat mirrors can be characterized using a standard interferometer coupled with stitching the subaperture measurement data. Such systems can measure the global full map of the optical surface by minimizing the inconsistency of data in the adjacent regions. We present a stitching technique that makes use of a commercial phase-shifting Twyman- Green interferometer in combination with an iterative optimized stitching algorithm. The proposed method has been applied to determine the surface errors of planar mirrors with an accuracy of a few nanometers. Moreover, the effect of reference wavefront error is explored. The feasibility and the performance of the proposed system are also demonstrated, along with a detailed error analysis and experimental results.

Citation Download Citation

Pengqian Yang, Stefan Hippler, Zhaojun Yan, Rainer Lenzen, Wolfgang Brandner, Casey Deen, Thomas Henning, Armin Huber, Sarah Kendrew, and Jianqiang Zhu "Surface figure measurement of flat mirrors based on the subaperture stitching interferometry", Proc. SPIE 8417, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, 841723 (15 October 2012); https://doi.org/10.1117/12.974568

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KEYWORDS

Interferometers

Mirrors

Optical testing

Stitching interferometry

Wavefronts

Interferometry

Calibration

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