High precision calibration for 2D optical standard

Shuanghua Sun; Xiaochuan Gan; Zi Xue; Xiaoyou Ye; Heyan Wang; Hongtang Gao

doi:10.1117/12.974263

15 October 2012 High precision calibration for 2D optical standard

Shuanghua Sun, Xiaochuan Gan, Zi Xue, Xiaoyou Ye, Heyan Wang, Hongtang Gao

Proceedings Volume 8417, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment; 84172H (2012) https://doi.org/10.1117/12.974263
Event: 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT 2012), 2012, Xiamen, China

Abstract

Photomask is a kind of 2-D optical standard with etched orthogonal coordinates made of a glass substrate chrominged or filmed with other metal. In order to solve the problems of measurement and traceability of ultra precision photomasks used in advanced manufacturing industry, 2-D photomask optical standard was calibrated in high precision laser two coordinate standard device. A high precision differential laser interferometer system was used for a length standard, a high magnification optical micro vision system was used for precision optical positioning feedback. In this paper, a image measurement model was purposed; A sampling window auto identification algorithm was designed. Grid stripe image could be identified and aimed at automatically by this algorithm. An edge detection method based on bidirection progressive scanning and 3-sigma rule for eliminating outliers in sampling window was found. Dirty point could be removed with effect. Edge detection error could be lowered. By this means, the measurement uncertainty of 2-D optical standard's ruling span was less than 0.3 micrometer (k=2).

Citation Download Citation

Shuanghua Sun, Xiaochuan Gan, Zi Xue, Xiaoyou Ye, Heyan Wang, and Hongtang Gao "High precision calibration for 2D optical standard", Proc. SPIE 8417, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, 84172H (15 October 2012); https://doi.org/10.1117/12.974263

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KEYWORDS

Photomasks

Optics manufacturing

Calibration

Precision calibration

Edge detection

Interferometers

Optical calibration

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