Influence of flare and NA error on lithography

Xuxia Wang; Lihui Liu; Yanqiu Li; Xuejia Guo; Chunying Han; Jianhong Yang

doi:10.1117/12.978626

15 October 2012 Influence of flare and NA error on lithography

Xuxia Wang, Lihui Liu, Yanqiu Li, Xuejia Guo, Chunying Han, Jianhong Yang

Proceedings Volume 8418, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Smart Structures, Micro- and Nano-Optical Devices, and Systems; 84180C (2012) https://doi.org/10.1117/12.978626
Event: 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT 2012), 2012, Xiamen, China

Abstract

More and more factors influence the lithography performance with the shrinkage of Critical Dimension (CD). CD error raised by litho tools imperfection cannot be ignored any more. Flare control and Numerical Aperture (NA) adjustment play a critical role in 90nm node dry lithography. In this paper, the respective and the joint impact of flare and NA error for 90nm dense line, semi-dense line and isolated line have been studied by simulation. The results show that the change of CD error is approximately linear with flare and NA error respectively. CD error and Depth of Focus (DOF) error for dense line are sensitive to the change of flare and NA error, especially the sensitivity of CD error to flare and NA error of dense line is larger than that of semi-dense line and isolated line. The placement error caused by flare and NA error is less than 10^-3 nm for these patterns. The joint impact of flare and NA error on lithography performance is not the linear sum of the results that two factors change respectively; there is a certain coupling effect between these two factors. For these patterns, the sensitivity of CD error to flare is larger than that to NA error, but a larger NA error can compensate the effect caused by flare. Therefore, the tolerance of flare can be relaxed by adjusting NA.

Citation Download Citation

Xuxia Wang, Lihui Liu, Yanqiu Li, Xuejia Guo, Chunying Han, and Jianhong Yang "Influence of flare and NA error on lithography", Proc. SPIE 8418, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Smart Structures, Micro- and Nano-Optical Devices, and Systems, 84180C (15 October 2012); https://doi.org/10.1117/12.978626

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KEYWORDS

Lithography

Critical dimension metrology

Error analysis

Photomasks

Lithographic illumination

Phase shifts

Imaging systems

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