Maskless lithography alignment method based on phase-shifting Moiré fringes technique

Jiangping Zhu; Song Hu; Jungshen Yu; Yan Tang

doi:10.1117/12.971463

15 October 2012 Maskless lithography alignment method based on phase-shifting Moiré fringes technique

Jiangping Zhu, Song Hu, Jungshen Yu, Yan Tang

Proceedings Volume 8418, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Smart Structures, Micro- and Nano-Optical Devices, and Systems; 84180L (2012) https://doi.org/10.1117/12.971463
Event: 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT 2012), 2012, Xiamen, China

Abstract

The relative position of wafer and mask can be calculated by information of Moiré fringe during alignment, a maskless lithography alignment method based on circular gratings Moiré fringes phase-shifting technique is proposed in this paper. Circular grating Moiré fringes have characteristics of measuring simultaneously angular displacement and line displacement. Location information of wafer in alignment can be real-time reflected in spatial phase of Moiré fringes. A digital micromirror device controlled by a computer is used to generate phase-shifting grating labels, and phase-shifting Moiré fringes will be formed by superposition of phase-shifting grating labels with grating label on the wafer. The position information of wafer can be abstained by phase analysis using Fourier transform method combined with phase-shifting technique，and gives feedback to the displacement stage to realize alignment. The theory basis of this method is emphatically introduced. Also, application of this method in maskless lithography alignment is analyzed in detail. Simulation results show that this method is high in accuracy, simple in operation and simple in algorithm. It provides a feasible method for lithography alignment technique.

Citation Download Citation

Jiangping Zhu, Song Hu, Jungshen Yu, and Yan Tang "Maskless lithography alignment method based on phase-shifting Moiré fringes technique", Proc. SPIE 8418, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Smart Structures, Micro- and Nano-Optical Devices, and Systems, 84180L (15 October 2012); https://doi.org/10.1117/12.971463

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
9 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Optical alignment

Phase shifts

Semiconducting wafers

Maskless lithography

Lithography

Digital micromirror devices

Superposition

Show All Keywords

Keywords/Phrases

Search In:

Publication Years