Subwavelength patterning based on a surface plasmon resonant cavity

Genhua Chen; Chinhua Wang; Wei Xiao; Fuyang Xu; Yiming Lou; Bing Cao; Guiju Zhang

doi:10.1117/12.975807

15 October 2012 Subwavelength patterning based on a surface plasmon resonant cavity

Genhua Chen, Chinhua Wang, Wei Xiao, Fuyang Xu, Yiming Lou, Bing Cao, Guiju Zhang

Proceedings Volume 8418, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Smart Structures, Micro- and Nano-Optical Devices, and Systems; 841813 (2012) https://doi.org/10.1117/12.975807
Event: 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT 2012), 2012, Xiamen, China

Abstract

With the development of Super Large Scale Integration (SLSI) and integrated optics, high-resolution photolithography has become more and more important. Traditional photolithography is limited by the optical diffraction of the system. Recent discovery of extraordinary behaviors of the surface plasmon polaritons suggests a novel method of photolithography beyond the diffraction limit. In this paper, we report on a novel subwavelength nanolithography technique using a surface plasmonic resonant cavity formed by two metallic layers separated by a photoresist layer with two incident beams illuminating from two sides. Finite-difference time-domain (FDTD) simulations show that a two-dimensional (2D) dot array pattern with a period of 70 nm can be obtained using an exposure radiation of 436nm wavelength. It is also found that the period of the 2D dot array is tunable which can be implemented by varying the cavity length.

Citation Download Citation

Genhua Chen, Chinhua Wang, Wei Xiao, Fuyang Xu, Yiming Lou, Bing Cao, and Guiju Zhang "Subwavelength patterning based on a surface plasmon resonant cavity", Proc. SPIE 8418, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Smart Structures, Micro- and Nano-Optical Devices, and Systems, 841813 (15 October 2012); https://doi.org/10.1117/12.975807

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
6 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Optical lithography

Surface plasmons

Silver

Diffraction

Lithography

Nanolithography

Photoresist materials

Show All Keywords

Keywords/Phrases

Search In:

Publication Years