Large aperture ratio machining of the Z-cut quartz base on MEMS technology

Haihe Xie; Xiaogfeng Jiang; Chun Lin; Xizhao Lu; Yuanqing Huang

doi:10.1117/12.956754

15 October 2012 Large aperture ratio machining of the Z-cut quartz base on MEMS technology

Haihe Xie, Xiaogfeng Jiang, Chun Lin, Xizhao Lu, Yuanqing Huang

Proceedings Volume 8418, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Smart Structures, Micro- and Nano-Optical Devices, and Systems; 84181B (2012) https://doi.org/10.1117/12.956754
Event: 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT 2012), 2012, Xiamen, China

Abstract

It is difficult to process quartz to get a large aperture ratio micropore(Φ127μm) by the mechanical tools, but it is possible processed by MEMS technology. The fluorine etching technology is used in experiments. The etching rate of quartz is proportional to the concentration of the HF acid. The etching rate of the mixtures of different proportions of the HF acid (49%) and the NH4F solution (35%) can be acquired, and the etching rate is lower if NH4F solution (35%) replace by the saturated NH4F solution. The experimental results conform to the chemical equation of Judge J S. In the experiment of the micropore etch, the wafers are respectively put in the mixtures of 1:1 and 3:2 ratio of the hydrofluoric acid (49%) and the ammonium fluoride solution (40%), and the morphology of micropore can be observed by the scanning electron microscopy and the confocal microscopy, and then the deepest depth of the micropore is tested by the confocal microscopy, the relationship between etching rate and the proportional of mixed solution can be got.

Citation Download Citation

Haihe Xie, Xiaogfeng Jiang, Chun Lin, Xizhao Lu, and Yuanqing Huang "Large aperture ratio machining of the Z-cut quartz base on MEMS technology", Proc. SPIE 8418, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Smart Structures, Micro- and Nano-Optical Devices, and Systems, 84181B (15 October 2012); https://doi.org/10.1117/12.956754

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
7 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Etching

Quartz

Crystals

HF etching

Semiconducting wafers

Microelectromechanical systems

Confocal microscopy

Show All Keywords

Keywords/Phrases

Search In:

Publication Years