Analysis of pinhole vector diffraction in visible-light

Li Wang; ChangHui Rao; XueJun Rao; JinSheng Yang

doi:10.1117/12.974352

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15 October 2012 Analysis of pinhole vector diffraction in visible light

Li Wang, ChangHui Rao, XueJun Rao, JinSheng Yang

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Proceedings Volume 8418, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Smart Structures, Micro- and Nano-Optical Devices, and Systems; 84181C (2012) https://doi.org/10.1117/12.974352
Event: 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT 2012), 2012, Xiamen, China

Abstract

Using Hartmann-Shack (H-S) wave-front sensor to test lenses with high numerical aperture, the reference spherical wave-front from pinhole is used to calibrate the Hartmann sensor to improve the precision of calibration, but intensity uniformity of the reference spherical wave-front affects the precision of Hartmann sensor’s calibration. Based on the vector diffraction theory, intensity uniformity is calculated with finite-difference time-domain method in case of a converging Gaussian incident visible light on pinhole. In order to proof the correctness of the intensity model of pinhole vector diffraction, experimentation of intensity is performed in visible-light. When the pinhole is the material aluminum with thickness 200nm and pinhole diameter 500nm, the absolute error of intensity uniformity is about 2.57% and 2.31% within 0.75 NA and 0.5 NA of diffracted wave-front by comparing experiment result with simulation result, so the intensity model is accurate.

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Li Wang, ChangHui Rao, XueJun Rao, and JinSheng Yang "Analysis of pinhole vector diffraction in visible light", Proc. SPIE 8418, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Smart Structures, Micro- and Nano-Optical Devices, and Systems, 84181C (15 October 2012); https://doi.org/10.1117/12.974352

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