Development of water-developable resist material derived from biomass in EB lithography

Satoshi Takei; Akihiro Oshima; Takanori Wakabayashi; Atsushi Sekiguchi; Takahiro Kozawa; Seiichi Tagawa

doi:10.1117/12.924802

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8 May 2012 Development of water-developable resist material derived from biomass in EB lithography

Satoshi Takei, Akihiro Oshima, Takanori Wakabayashi, Atsushi Sekiguchi, Takahiro Kozawa, Seiichi Tagawa

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Proceedings Volume 8428, Micro-Optics 2012; 84281V (2012) https://doi.org/10.1117/12.924802
Event: SPIE Photonics Europe, 2012, Brussels, Belgium

Abstract

A water developable, non-chemically amplified, high sensitive, and negative tone resist material in the developable process of EB lithography was investigated for environmental affair, safety, easiness of handling, and health of the working people, instead of the common developable process of trimethylphenylammonium hydroxide or resist solvents. The material design concept to use the plantbased resist material derived from biomass was proposed. A novel high-sensitive negative tone of plantbased resist material with the sugar chain structure derived from biomass on underlayer was demonstrated in EB lithography for the future production of optical and electronic devices. The 400 nm line patterning images with exposure dose of 7.0 μC/cm² were provided by specific process conditions of EB lithography for optical and electronic devices.

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Satoshi Takei, Akihiro Oshima, Takanori Wakabayashi, Atsushi Sekiguchi, Takahiro Kozawa, and Seiichi Tagawa "Development of water-developable resist material derived from biomass in EB lithography", Proc. SPIE 8428, Micro-Optics 2012, 84281V (8 May 2012); https://doi.org/10.1117/12.924802

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