Shadowing 3D mask effects in EUV

Eytan Barouch

doi:10.1117/12.964977

29 June 2012 Shadowing 3D mask effects in EUV

Eytan Barouch

Proceedings Volume 8441, Photomask and Next-Generation Lithography Mask Technology XIX; 84411L (2012) https://doi.org/10.1117/12.964977
Event: Photomask and NGL Mask Technology XIX, 2012, Yokohama, Japan

Abstract

A new method to evaluate the shadowing effect of 3-dimensional mask has been developed and implemented for extreme UV technology. The method is composed of several key ingredients. The illuminator(source) is divided into very small domains to account for the partial coherence nature of the illumination employed by the microchip industry. Each sub-domain acts as an incoherent source emitting a partial vector electromagnetic field. Since the design on the mask is described on a sub- nanometer(nm) grid and the features are 20-40nm, a non-uniformed grid is essential for a manageable computation. Consequently, the space describing the mask is a mixture of momenta(kx,ky) and physical space(z-direction). The corresponding Maxwell equations are translated to the mask space and the transmitted wave of each sub illuminator is propagated through the optical system. This construction eliminates the usual use of the Kirchhoff boundary conditions which are normally used in the formation of the aerial image. Instead the integration over the source(illuminator) takes place over the propagated field into the photoresist constructing the latent image directly. Employing a previously developed techniques the latent image is translated into photoacid concentration, enabling the determination of the developed photoresist structures. By using the described methodology, a shadowing effect is detected and by the usage of a newly developed optimization-scheme of the shape of the source the shadowing effect can be minimized or even eliminated.

Citation Download Citation

Eytan Barouch "Shadowing 3D mask effects in EUV", Proc. SPIE 8441, Photomask and Next-Generation Lithography Mask Technology XIX, 84411L (29 June 2012); https://doi.org/10.1117/12.964977

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KEYWORDS

Photomasks

Radio propagation

Extreme ultraviolet

Algorithm development

Electromagnetism

Wave propagation

Extreme ultraviolet lithography

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