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17 September 2012 Progress in new ultraviolet reflective coating techniques
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Current FUV instrumentation is seriously compromised by poor reflectivity. The best existing coatings for the 90 – 115 nm range are SiC (30% reflectivity across the band) and LiF/Aluminum (60% reflectivity from 100 nm to 115 nm). An improved coating therefore would enable the production of vastly more sensitive instruments in the 90 – 200 nm range. An additional goal in the development of an alternate FUV coating is to overcome the well-documented hygroscopic behaviors of LiF coatings, which currently impose handling concerns that in turn drive cost and schedule. The coatings we will develop in this effort must also function well through the conventional silicon-based detector bandpass (200 nm to 1100 nm). By ensuring that these new coatings are usable at many wavelengths, we will make it possible to incorporate ultraviolet instruments into future large missions without compromising the science capability of other instruments or increasing cost and risk due to handling issues. We present new results of the coating process and discuss our new ALD processes.
© (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Matthew Beasley, Frank Greer, and Shouleh Nikzad "Progress in new ultraviolet reflective coating techniques", Proc. SPIE 8443, Space Telescopes and Instrumentation 2012: Ultraviolet to Gamma Ray, 84433Q (17 September 2012);

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