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24 September 2012 A mask quality control tool for the OSIRIS multi-object spectrograph
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OSIRIS multi object spectrograph uses a set of user-customised-masks, which are manufactured on-demand. The manufacturing process consists of drilling the specified slits on the mask with the required accuracy. Ensuring that slits are on the right place when observing is of vital importance. We present a tool for checking the quality of the process of manufacturing the masks which is based on analyzing the instrument images obtained with the manufactured masks on place. The tool extracts the slit information from these images, relates specifications with the extracted slit information, and finally communicates to the operator if the manufactured mask fulfills the expectations of the mask designer. The proposed tool has been built using scripting languages and using standard libraries such as opencv, pyraf and scipy. The software architecture, advantages and limits of this tool in the lifecycle of a multiobject acquisition are presented.
© (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
J. C. López-Ruiz, Jacinto Javier Vaz Cedillo, Alessandro Ederoclite, Ángel Bongiovanni, and Víctor González Escalera "A mask quality control tool for the OSIRIS multi-object spectrograph", Proc. SPIE 8451, Software and Cyberinfrastructure for Astronomy II, 84511Q (24 September 2012);

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