Investigation of the optical and structural properties of WO[sub]3[/sub] thin films with different sputtering power supplies

Hsi-Chao Chen; Der-Jun Jan; Chien-Han Chen; Kuo-Ting Huang; Yu-Siang Luo; Jia-Min Chen

doi:10.1117/12.929588

11 October 2012 Investigation of the optical and structural properties of WO₃ thin films with different sputtering power supplies

Hsi-Chao Chen, Der-Jun Jan, Chien-Han Chen, Kuo-Ting Huang, Yu-Siang Luo, Jia-Min Chen

Author Affiliations +

Proceedings Volume 8486, Current Developments in Lens Design and Optical Engineering XIII; 84861F (2012) https://doi.org/10.1117/12.929588
Event: SPIE Optical Engineering + Applications, 2012, San Diego, California, United States

Abstract

The purpose of this research was to investigate the optical and structural properties of tungsten oxide (WO₃) thin films deposited with three different sputtering power supplies: direct current (DC), DC pulse and radio frequency (RF). These WO₃ thin films were deposited on ITO glass and silicon substrate with different gas ratios of oxygen and argon (O₂/Ar ratio). WO₃ thin film is the role of the electrochromic window was resulted from the advantages of large variation in optical density, high response efficiency, no toxicity and low cost. The experimental results showed that optical intensity increased with the increasing of O₂/Ar ratio and all films have the 950cm^-1 peak which the bonding of W⁺⁶=O in Raman spectra. Hence, the O₂/Ar ratio was changed from 0.4 to 0.8 to study the ability of coloring and bleaching for the three different power supplies. Anyways, the WO₃ thin films had the best electrochromic property at the O₂/Ar ratio of 0.7, 0.6 and 0.6 for DC, DC pulse, and RF, respectively. The transmittances could be over 75% for all films at as-deposited and the deposition rates were between 0.8 and 0.1 Ås^-1. Simultaneously, the transmittance variations (ΔT) were 51%, 57% and 53% for DC, DC pulse, and RF power sources at wavelength of 550 nm, respectively. The coloration ability of WO₃ thin film deposition with power supply of DC pulse was better than that of the DC and RF.

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Hsi-Chao Chen, Der-Jun Jan, Chien-Han Chen, Kuo-Ting Huang, Yu-Siang Luo, and Jia-Min Chen "Investigation of the optical and structural properties of WO₃ thin films with different sputtering power supplies", Proc. SPIE 8486, Current Developments in Lens Design and Optical Engineering XIII, 84861F (11 October 2012); https://doi.org/10.1117/12.929588

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