Study for compensation of unexpected image placement error caused by VSB mask writer deflector

Hyun-joo Lee; Min-kyu Choi; Seong-yong Moon; Han-Ku Cho; Jonggul Doh; Jinho Ahn

doi:10.1117/12.964098

8 November 2012 Study for compensation of unexpected image placement error caused by VSB mask writer deflector

Hyun-joo Lee, Min-kyu Choi, Seong-yong Moon, Han-Ku Cho, Jonggul Doh, Jinho Ahn

Author Affiliations +

Proceedings Volume 8522, Photomask Technology 2012; 852228 (2012) https://doi.org/10.1117/12.964098
Event: SPIE Photomask Technology, 2012, Monterey, California, United States

Abstract

The Electron Optical System (EOS) is designed for the electron beam machine employing a vector scanned variable shaped beam (VSB) with the deflector. Most VSB systems utilize multi stage deflection architecture to obtain a high precision and a high-speed deflection at the same time. Many companies use the VSB mask writer and they have a lot of experiences about Image Placement (IP) error suffering from contaminated EOS deflector. And also most of VSB mask writer users are having already this error. In order to use old VSB mask writer, we introduce the method how to compensate unexpected IP error from VSB mask writer. There are two methods to improve this error due to contaminated deflector. The one is the usage of 2nd stage grid correction in addition to the original stage grid. And the other is the usage of uncontaminated area in the deflector. According to the results of this paper, 30% of IP error can be reduced by 2nd stage grid correction and the change of deflection area in deflector. It is the effective method to reduce the deflector error at the VSB mask writer. And it can be the one of the solution for the long-term production of photomask.

Citation Download Citation

Hyun-joo Lee, Min-kyu Choi, Seong-yong Moon, Han-Ku Cho, Jonggul Doh, and Jinho Ahn "Study for compensation of unexpected image placement error caused by VSB mask writer deflector", Proc. SPIE 8522, Photomask Technology 2012, 852228 (8 November 2012); https://doi.org/10.1117/12.964098

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

;

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE