355nm absorption in HfO2 and SiO2 monolayers with embedded Hf nanoclusters studied using photothermal heterodyne imaging

S. Papernov; E. Shin; T. Murray; A. W. Schmid; J. B. Oliver

doi:10.1117/12.981642

4 December 2012 355nm absorption in HfO₂ and SiO₂ monolayers with embedded Hf nanoclusters studied using photothermal heterodyne imaging

S. Papernov, E. Shin, T. Murray, A. W. Schmid, J. B. Oliver

Author Affiliations +

Proceedings Volume 8530, Laser-Induced Damage in Optical Materials: 2012; 85301H (2012) https://doi.org/10.1117/12.981642
Event: SPIE Laser Damage, 2012, Boulder, Colorado, United States

Abstract

The role of the Hf nanoclusters as near-UV, nanosecond-pulse laser-damage initiators in HfO₂ and SiO₂-pair–based multilayer coatings remains speculative. In this work we use photothermal heterodyne imaging (PHI) to investigate absorption in HfO₂ and SiO₂ monolayers containing embedded nanometer-sized Hf clusters produced by backsidethrough- thin-film ablation. Hf cluster size and areal-density distributions were characterized using transmission electron microscopy. PHI measurements were taken for cluster-containing samples and for similarly prepared HfO₂ and SiO₂ film samples of the same thickness without clusters. These data allow us to evaluate a possible role in the damageprocess initiation of two hypothetical sources of the localized absorption—Hf clusters and high-density areas of electronic defects.

Citation Download Citation

S. Papernov, E. Shin, T. Murray, A. W. Schmid, and J. B. Oliver "355nm absorption in HfO₂ and SiO₂ monolayers with embedded Hf nanoclusters studied using photothermal heterodyne imaging", Proc. SPIE 8530, Laser-Induced Damage in Optical Materials: 2012, 85301H (4 December 2012); https://doi.org/10.1117/12.981642

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