You have requested a machine translation of selected content from our databases. This functionality is provided solely for your convenience and is in no way intended to replace human translation. Neither SPIE nor the owners and publishers of the content make, and they explicitly disclaim, any express or implied representations or warranties of any kind, including, without limitation, representations and warranties as to the functionality of the translation feature or the accuracy or completeness of the translations.
Translations are not retained in our system. Your use of this feature and the translations is subject to all use restrictions contained in the Terms and Conditions of Use of the SPIE website.
27 November 2012Making the mid-infrared nano with designer plasmonic materials
Here we demonstrate a new class of designer plasmonic materials for use in the mid-infrared (mid-IR) region of the electromagnetic spectrum. By heavily doping epitaxially-grown semiconductor materials, we are able to grow single-crystal materials whose optical properties in the mid-IR mimic those of metals at shorter wavelengths. We demonstrate materials with plasma frequencies from 5.5-15μm and low losses, compared to their shortwavelength counterparts. In addition, we demonstrate the ability of subwavelength particles formed from our materials to support localized surface plasmon resonances, and measure the near-field absorption of these structures using a novel nanoscale infrared spectroscopy technique. Finally, we show good agreement between our observed results and analytical and finite-element models of our materials and structures. The results presented offer a path towards nanoscale confinement of light with micron-scale wavelengths.
The alert did not successfully save. Please try again later.
S. Law, J. Felts, C. Roberts, V. A. Podolskiy, W. P. King, D. Wasserman, "Making the mid-infrared nano with designer plasmonic materials," Proc. SPIE 8555, Optoelectronic Devices and Integration IV, 855503 (27 November 2012); https://doi.org/10.1117/12.999990