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Through rigorous numerical methods, such as Finite Different Time Domain or Rigorous Coupled-Wave Analysis, we then designed several structures theoretically demonstrating an antireflective character within the middle infrared region. From the opto-geometrical parameters such as period, depth and shape of the pattern determined by numerical analysis, these structures have been fabricated using controlled slope plasma etching processes. Afterwards, optical characterizations of several samples were carried out. The reflectance of the grating in the near and middle infrared domains has been measured by Fourier Transform Infrared spectrometry and a comparison with numerical analysis has been made. As expected, those structures offer a fair antireflective character in the region of interest. Further numerical investigations led to the fact that patterning the top of the cone could enlarge the antireflective domain to the visible region. Thus, as with the simple cone grating, a comparison of the numerical analysis with the experimental measurements is made. Finally, diffracted orders are studied and compared between both structures. Those orders are critical and must be limited as one wants to avoid crosstalk phenomena in imaging systems. |
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Reflectivity
Antireflective coatings
Silicon
Numerical analysis
Finite-difference time-domain method
FT-IR spectroscopy
Mid-IR
