New Integrated Optics Structure On Silicon Substrate: Application to Optical Communication And Optical Interconnects

S. Valette; J. P. Jadot; P. Gidon; S. Renard

doi:10.1117/12.943463

14 April 1988 New Integrated Optics Structure On Silicon Substrate: Application to Optical Communication And Optical Interconnects

S. Valette, J. P. Jadot, P. Gidon, S. Renard

Author Affiliations +

Proceedings Volume 0862, Optical Interconnections; (1988) https://doi.org/10.1117/12.943463
Event: 1987 Symposium on the Technologies for Optoelectronics, 1987, Cannes, France

Abstract

We describe a new integrated optics structure achieved on silicon substrate by chemical vapor deposition of silica. That structure allows the realization of integrated optical circuit very attractive in the field of optical communications (multiplexer and demultiplexer, couplers...) but also in the new field of optical interconnects.

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S. Valette, J. P. Jadot, P. Gidon, and S. Renard "New Integrated Optics Structure On Silicon Substrate: Application to Optical Communication And Optical Interconnects", Proc. SPIE 0862, Optical Interconnections, (14 April 1988); https://doi.org/10.1117/12.943463

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