High-performance broadband plasmonic absorber in visible fabricated by nanoimprint lithography

Peng Zhu; L. Jay Guo

doi:10.1117/12.2004131

21 February 2013 High-performance broadband plasmonic absorber in visible fabricated by nanoimprint lithography

Peng Zhu, L. Jay Guo

Proceedings Volume 8632, Photonic and Phononic Properties of Engineered Nanostructures III; 86321A (2013) https://doi.org/10.1117/12.2004131
Event: SPIE OPTO, 2013, San Francisco, California, United States

Abstract

We demonstrate a nanostructured broadband absorber in visible range. Two kinds of structures with different absorption ranges are designed and fabricated using nanoimprint lithography. Experiments show a flat absorption spectra with an average absorption of 85% from 400 nm to 700 nm. The proposed structures could be used in the applications of thin-film thermal emitters and photovoltaic devices.

Citation Download Citation

Peng Zhu and L. Jay Guo "High-performance broadband plasmonic absorber in visible fabricated by nanoimprint lithography", Proc. SPIE 8632, Photonic and Phononic Properties of Engineered Nanostructures III, 86321A (21 February 2013); https://doi.org/10.1117/12.2004131

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