Paper
11 December 2012 Lab-scale EUV nano-imaging employing a gas-puff-target source: image quality versus plasma radiation characteristics
Author Affiliations +
Proceedings Volume 8678, Short-Wavelength Imaging and Spectroscopy Sources; 867807 (2012) https://doi.org/10.1117/12.2006090
Event: Short-Wavelength Imaging and Spectroscopy, 2012, Bern, Switzerland
Abstract
In this chapter we report a desk-top microscopy reaching 50nm spatial resolution in very compact setup using a gas-puff laser plasma EUV source. We present the study of source bandwidth influence on the extreme ultraviolet (EUV) microscope spatial resolution. EUV images of object obtained by illumination with variable bandwidth EUV radiation were compared in terms of knife-edge spatial resolution to study the wide bandwidth parasitic influence on spatial resolution in the EUV microscopy.
© (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Przemyslaw Wachulak, Andrzej Bartnik, and Henryk Fiedorowicz "Lab-scale EUV nano-imaging employing a gas-puff-target source: image quality versus plasma radiation characteristics", Proc. SPIE 8678, Short-Wavelength Imaging and Spectroscopy Sources, 867807 (11 December 2012); https://doi.org/10.1117/12.2006090
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KEYWORDS
Extreme ultraviolet

Plasma

Spatial resolution

Xenon

Argon

Microscopes

Zone plates

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