Oxide nanoparticle EUV resists: toward understanding the mechanism of positive and negative tone patterning

Souvik Chakrabarty; Christine Ouyang; Marie Krysak; Markos Trikeriotis; Kyoungyoung Cho; Emmanuel P. Giannelis; Christopher K. Ober

doi:10.1117/12.2011490

1 April 2013 Oxide nanoparticle EUV resists: toward understanding the mechanism of positive and negative tone patterning

Souvik Chakrabarty, Christine Ouyang, Marie Krysak, Markos Trikeriotis, Kyoungyoung Cho, Emmanuel P. Giannelis, Christopher K. Ober

Author Affiliations +

Proceedings Volume 8679, Extreme Ultraviolet (EUV) Lithography IV; 867906 (2013) https://doi.org/10.1117/12.2011490
Event: SPIE Advanced Lithography, 2013, San Jose, California, United States

Abstract

DUV, EUV and e-beam patterning of hybrid nanoparticle photoresists have been reported previously by Ober and coworkers. The present work explores the underlying mechanism that is responsible for the dual tone patterning capability of these photoresist materials. Spectroscopic results correlated with mass loss and dissolution studies suggest a ligand exchange mechanism responsible for altering the solubility between the exposed and unexposed regions.

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Souvik Chakrabarty, Christine Ouyang, Marie Krysak, Markos Trikeriotis, Kyoungyoung Cho, Emmanuel P. Giannelis, and Christopher K. Ober "Oxide nanoparticle EUV resists: toward understanding the mechanism of positive and negative tone patterning", Proc. SPIE 8679, Extreme Ultraviolet (EUV) Lithography IV, 867906 (1 April 2013); https://doi.org/10.1117/12.2011490

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