Effect of leaving group design on EUV lithography performance

Owendi Ongayi; Vipul Jain; Suzanne M. Coley; David Valeri; Amy Kwok; Dung Quach; Mike Wagner; Jim Cameron; Jim Thackeray

doi:10.1117/12.2011600

1 April 2013 Effect of leaving group design on EUV lithography performance

Owendi Ongayi, Vipul Jain, Suzanne M. Coley, David Valeri, Amy Kwok, Dung Quach, Mike Wagner, Jim Cameron, Jim Thackeray

Author Affiliations +

Proceedings Volume 8679, Extreme Ultraviolet (EUV) Lithography IV; 867907 (2013) https://doi.org/10.1117/12.2011600
Event: SPIE Advanced Lithography, 2013, San Jose, California, United States

Abstract

In this paper, we will describe some of our efforts on various leaving group designs and their impacts on resist performance, mainly focusing on the leaving group polarity, activation energy and molecular volume. The EUV lithographic performances of the newly designed leaving groups are evaluated on a standard methacrylate polymer bound photoacid generator (PBP) platform. With our low activation energy and hydrophobic leaving group PBP, we report good line and space and contact hole performance using the Albany eMET and LBNL BMET tool.

Citation Download Citation

Owendi Ongayi, Vipul Jain, Suzanne M. Coley, David Valeri, Amy Kwok, Dung Quach, Mike Wagner, Jim Cameron, and Jim Thackeray "Effect of leaving group design on EUV lithography performance", Proc. SPIE 8679, Extreme Ultraviolet (EUV) Lithography IV, 867907 (1 April 2013); https://doi.org/10.1117/12.2011600

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