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1 April 2013 Lifetime and refurbishment of multilayer LPP collector mirrors
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The usable power of high-power EUV light sources at 13.5 nm and also the lifetime of source and collector optics are currently considered to be the largest challenges encountered during the transition of EUV lithography from the current beta-tool status to high-volume manufacturing. Fraunhofer IOF Jena has developed cost-effective refurbishment technologies of multilayer-based near normal incidence collector mirrors for high-power laser-produced plasma sources. Presently, the collector mirror lifetime exceeds 80 billion laser pulses which correspond to a lifetime of several months during continuous use of the source. Together with their partners Cymer is currently carrying out a focused program to improve the collector lifetime. New multilayer coatings together with new in-situ cleaning strategies during source operation are key technology development strategies to get closer to the ultimate target of about one year collector lifetime. The paper discusses different LPP collector refurbishment strategies and presents the recent status on collector refurbishment techniques.
© (2013) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Torsten Feigl, Marco Perske, Hagen Pauer, Tobias Fiedler, Sergiy Yulin, Norbert Kaiser, Andreas Tünnermann, Norbert R. Böwering, Alex I. Ershov, Silvia de Dea, Kay Hoffmann, Bruno La Fontaine, Igor V. Fomenkov, and David C. Brandt "Lifetime and refurbishment of multilayer LPP collector mirrors", Proc. SPIE 8679, Extreme Ultraviolet (EUV) Lithography IV, 86790C (1 April 2013);

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