Application of phase shift focus monitor in EUVL process control

Lei Sun; Sudhar Raghunathan; Vibhu Jindal; Eric Gullikson; Pawitter Mangat; Iacopo Mochi; Kenneth A. Goldberg; Markus P. Benk; Oleg Kritsun; Tom Wallow; Deniz Civay; Obert Wood

doi:10.1117/12.2011342

1 April 2013 Application of phase shift focus monitor in EUVL process control

Lei Sun, Sudhar Raghunathan, Vibhu Jindal, Eric Gullikson, Pawitter Mangat, Iacopo Mochi, Kenneth A. Goldberg, Markus P. Benk, Oleg Kritsun, Tom Wallow, Deniz Civay, Obert Wood

Author Affiliations +

Proceedings Volume 8679, Extreme Ultraviolet (EUV) Lithography IV; 86790T (2013) https://doi.org/10.1117/12.2011342
Event: SPIE Advanced Lithography, 2013, San Jose, California, United States

Abstract

Both 90.9° and 180° phase shifts have been achieved using a new Phase Shift Mask (PSM) structure. This PSM is intended for use as a focus monitor. Both the EUV images of the focus monitor patterns on the new EUV PSM test mask, obtained from the SEMATECH/Berkeley Actinic Inspection Microscope (AIT), and the SEMATECH EUV Micro Exposure Tool (MET), shows that an alternating PSM EUV mask can be effectively used for EUVL focus monitoring.

Citation Download Citation

Lei Sun, Sudhar Raghunathan, Vibhu Jindal, Eric Gullikson, Pawitter Mangat, Iacopo Mochi, Kenneth A. Goldberg, Markus P. Benk, Oleg Kritsun, Tom Wallow, Deniz Civay, and Obert Wood "Application of phase shift focus monitor in EUVL process control", Proc. SPIE 8679, Extreme Ultraviolet (EUV) Lithography IV, 86790T (1 April 2013); https://doi.org/10.1117/12.2011342

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