Homogeneity improvement of TiO2-SiO2 glass synthesized by the soot method and its evaluation using the ultrasonic measurement system

Masahiro Kawagishi; Junko Konishi; Masaaki Takata; Mototaka Arakawa; Yuji Ohashi; Jun-ichi Kushibiki

doi:10.1117/12.2011655

1 April 2013 Homogeneity improvement of TiO₂-SiO₂ glass synthesized by the soot method and its evaluation using the ultrasonic measurement system

Masahiro Kawagishi, Junko Konishi, Masaaki Takata, Mototaka Arakawa, Yuji Ohashi, Jun-ichi Kushibiki

Author Affiliations +

Proceedings Volume 8679, Extreme Ultraviolet (EUV) Lithography IV; 86791N (2013) https://doi.org/10.1117/12.2011655
Event: SPIE Advanced Lithography, 2013, San Jose, California, United States

Abstract

TiO₂-SiO₂ glass is one of the leading candidates for optical elements of extreme ultraviolet lithography. TiO₂-SiO₂ glass synthesized by the soot method has shown striae related to inhomogeneity of TiO₂ concentration formed in the planes perpendicular to soot growth direction in the synthesis process. It can induce CTE variation and localized surface roughness. Striae were characterized in three modes by polarization microscope. Such striae were improved with an improved gas condition and developing a modified material gas supply system. Specimen prepared from the improved TiO₂-SiO₂ glass was evaluated by a line-focus-beam ultrasonic material characterization system, using a surface-acoustic-wave mode. Improved glass had 43% striae level compared to conventional glass by birefringence measurement, 31% compared to conventional glass by the ultrasonic measurement. It was found that improved glass had good homogeneity to both directions perpendicular and parallel to striae plane.

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Masahiro Kawagishi, Junko Konishi, Masaaki Takata, Mototaka Arakawa, Yuji Ohashi, and Jun-ichi Kushibiki "Homogeneity improvement of TiO₂-SiO₂ glass synthesized by the soot method and its evaluation using the ultrasonic measurement system", Proc. SPIE 8679, Extreme Ultraviolet (EUV) Lithography IV, 86791N (1 April 2013); https://doi.org/10.1117/12.2011655

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