Orientation and position-controlled block copolymer nanolithography for bit-patterned media

R. Yamamoto; M. Kanamaru; K. Sugawara; N. Sasao; Y. Ootera; T. Okino; H. Hieda; N. Kihara; Y. Kamata; A. Kikitsu

doi:10.1117/12.2012654

26 March 2013 Orientation and position-controlled block copolymer nanolithography for bit-patterned media

R. Yamamoto, M. Kanamaru, K. Sugawara, N. Sasao, Y. Ootera, T. Okino, H. Hieda, N. Kihara, Y. Kamata, A. Kikitsu

Proceedings Volume 8680, Alternative Lithographic Technologies V; 86801U (2013) https://doi.org/10.1117/12.2012654
Event: SPIE Advanced Lithography, 2013, San Jose, California, United States

Abstract

Bit-patterned media (BPM) is a candidate for high-density magnetic recording media. Directed self-assembly (DSA) is expected to be a solution for the fabrication process of high-density BPM. A BPM with 20 nm-pitch dot pattern is fabricated. A 100 nm-pitch triangle lattice dot pattern, which is fabricated by EB lithography, is used as a guide post to order PS-PDMS self-assembled diblock co-polymer with 20 nm pitch. Dot-pitch fluctuation and linearity of pseudo dot tracks are estimated. The standard deviation of the dot-pitch variation including the post guide is 8% of the self-assembled dot pitch. The dot-position deviation is estimated to be about 8% of the pseudo dot track pitch. In both cases, variation of the size and pitch of the post guides is found to increase the dot-pitch fluctuation and dot-position deviation from pseudo dot-track.

Citation Download Citation

R. Yamamoto, M. Kanamaru, K. Sugawara, N. Sasao, Y. Ootera, T. Okino, H. Hieda, N. Kihara, Y. Kamata, and A. Kikitsu "Orientation and position-controlled block copolymer nanolithography for bit-patterned media", Proc. SPIE 8680, Alternative Lithographic Technologies V, 86801U (26 March 2013); https://doi.org/10.1117/12.2012654

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