28nm FD-SOI metal gate profile optimization, CD and undercut monitoring using scatterometry measurement

R. Bouyssou; B. Le Gratiet; P. Gouraud; L. Desvoivres; G. Briend; B. Dumont

doi:10.1117/12.2010746

10 April 2013 28nm FD-SOI metal gate profile optimization, CD and undercut monitoring using scatterometry measurement

R. Bouyssou, B. Le Gratiet, P. Gouraud, L. Desvoivres, G. Briend, B. Dumont

Proceedings Volume 8681, Metrology, Inspection, and Process Control for Microlithography XXVII; 86810R (2013) https://doi.org/10.1117/12.2010746
Event: SPIE Advanced Lithography, 2013, San Jose, California, United States

Abstract

Gate patterning control for 28nm Fully Depleted Silicon On Insulator (FD-SOI) technology faces several challenges. For lithography and etch , usage of DoseMapper requires extensive and accurate metrology to compute adequate dose recipes. From etch side we will have to control both polysilicon and metal gate CD’s. For device integration it will be extremely important to monitor N and PMOS devices and get appropriate gate profiles since transistor morphology is a key contributor to device performances. In parallel of CD control, thin silicon film on top of buried oxide layer will also require a strict control of its thickness. Scatterometry is the only way to get all these informations from a patterned environment [1]. We will show in this paper how scatterometry has been proven to be accurate enough to support the realization of DOE’s for metal gate profile optimisation at gate patterning without doing hundred’s of TEM. Scatterometry results are correlated to parametric tests and TEM for ultimate validation.

Citation Download Citation

R. Bouyssou, B. Le Gratiet, P. Gouraud, L. Desvoivres, G. Briend, and B. Dumont "28nm FD-SOI metal gate profile optimization, CD and undercut monitoring using scatterometry measurement", Proc. SPIE 8681, Metrology, Inspection, and Process Control for Microlithography XXVII, 86810R (10 April 2013); https://doi.org/10.1117/12.2010746

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available