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12 April 2013 Comprehensive thermal aberration and distortion control of lithographic lenses for accurate overlay
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Abstract
Accurate overlay with high throughput is the key to success in multiple-patterning lithography. To achieve accurate overlay, the imaging system must control and minimize the thermal aberration and distortion. There are several sources of thermal aberration in an immersion lithography system: (1) reticle deformation by reticle heating; (2) air temperature fluctuation near the reticle; (3) thermal aberrations from the projection lens; and (4) immersion water temperature fluctuation. All aberrations and distortion are impacted by these sources and need to be minimized for accurate overlay. In this paper, we introduce our approach and technologies for the control of thermal aberrations.
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Yohei Fujishima, Satoshi Ishiyama, Susumu Isago, Akihiro Fukui, Hajime Yamamoto, Toru Hirayama, Tomoyuki Matsuyama, and Yasuhiro Ohmura "Comprehensive thermal aberration and distortion control of lithographic lenses for accurate overlay", Proc. SPIE 8683, Optical Microlithography XXVI, 86831I (12 April 2013); https://doi.org/10.1117/12.2010908
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