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12 April 2013 High-productivity immersion scanner enabling 1xnm hp manufacturing
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Abstract
NSR-S622D, Nikon’s new ArF immersion scanner, provides the best and practicable solutions to meet the escalating requirement from device manufactures to accommodate the further miniaturization of device pattern. NSR-S622D has various additional functions compared to the previous model such as the newly developed illumination system, new projection lens, new AF system new wafer table in addition to the matured Streamlign platform. These new features will derive the outstanding performance of NSR, enabling highly controlled CD uniformity, focus accuracy and overlay accuracy. NSR-S622D will provide the adequate capabilities that are demanded from a lithography tool for production of 1x nm hp node and beyond.
© (2013) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yosuke Shirata, Yuichi Shibazaki, Junichi Kosugi, Takahisa Kikuchi, and Yasuhiro Ohmura "High-productivity immersion scanner enabling 1xnm hp manufacturing", Proc. SPIE 8683, Optical Microlithography XXVI, 86831K (12 April 2013); https://doi.org/10.1117/12.2011123
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