Model of freeform illumination mode and polarization mode for 193nm immersion lithographic machine

Yunbo Zhang; Aijun Zeng; Ying Wang; Mingxing Chen; Huijie Huang

doi:10.1117/12.2011517

12 April 2013 Model of freeform illumination mode and polarization mode for 193nm immersion lithographic machine

Yunbo Zhang, Aijun Zeng, Ying Wang, Mingxing Chen, Huijie Huang

Proceedings Volume 8683, Optical Microlithography XXVI; 868329 (2013) https://doi.org/10.1117/12.2011517
Event: SPIE Advanced Lithography, 2013, San Jose, California, United States

Abstract

The 193nm immersion lithographic machine has already achieved 22nm node and beyond, and its illuminator has become a polarized and off-axis illumination system. Illumination modes and polarization modes can be formed by different diffraction optical elements and polarization optical elements. This paper proposes a model including a micromirror array and a variable retarder array for forming freeform illumination mode and polarization mode. They can be achieved by controlling the retardations of the variable retarders and two-dimensional tilt angles of the micromirrors. The principles of the model are analyzed, and some equations are acquired. Circular illumination mode, tangential polarization modes have been obtained in the simulation experiments. The simulation results show the model is feasible for the 193 nm immersion lithography machine.

Citation Download Citation

Yunbo Zhang, Aijun Zeng, Ying Wang, Mingxing Chen, and Huijie Huang "Model of freeform illumination mode and polarization mode for 193nm immersion lithographic machine ", Proc. SPIE 8683, Optical Microlithography XXVI, 868329 (12 April 2013); https://doi.org/10.1117/12.2011517

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