A customized Exicor system for measuring residual birefringence in lithographic lenses

Andy Breninger; Baoliang (Bob) Wang

doi:10.1117/12.2011608

12 April 2013 A customized Exicor system for measuring residual birefringence in lithographic lenses

Andy Breninger, Baoliang (Bob) Wang

Proceedings Volume 8683, Optical Microlithography XXVI; 86832D (2013) https://doi.org/10.1117/12.2011608
Event: SPIE Advanced Lithography, 2013, San Jose, California, United States

Abstract

As optical lithography continues to produce ever smaller features on a chip, the industry imposes tighter quality parameters on the optical components used in a lithographic step and scan system. Residual linear birefringence is one such parameter. Currently, optical component suppliers use the Exicor birefringence measurement systems that we have developed to measure photomask blanks and lens blanks to ensure their quality. In this paper, we report a new model of Exicor birefringence measurement system that is specifically designed for measuring lenses. Unlike lens blanks that have flat surfaces, lenses have curved surfaces that refract the measuring light beam to different angles. In this new model of birefringence measurement system, we combine motion control of the light source module, the detector module and the lens under test to achieve accurate measurement of residual birefringence of a lens at different incident angles.

Citation Download Citation

Andy Breninger and Baoliang (Bob) Wang "A customized Exicor system for measuring residual birefringence in lithographic lenses", Proc. SPIE 8683, Optical Microlithography XXVI, 86832D (12 April 2013); https://doi.org/10.1117/12.2011608

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