Process window analysis of algorithmic assist feature placement options at the 2X nm node DRAM

Jinhyuck Jeon; Shinyoung Kim; Jookyoung Song; Chanha Park; Hyunjo Yang; Donggyu Yim; Brian Ward; Yunqiang Zhang; Kevin Hooker; Munhoe Do; Jung-Hoe Choi; Stephen Jang

doi:10.1117/12.2011450

29 March 2013 Process window analysis of algorithmic assist feature placement options at the 2X nm node DRAM

Jinhyuck Jeon, Shinyoung Kim, Jookyoung Song, Chanha Park, Hyunjo Yang, Donggyu Yim, Brian Ward, Yunqiang Zhang, Kevin Hooker, Munhoe Do, Jung-Hoe Choi, Stephen Jang

Author Affiliations +

Proceedings Volume 8684, Design for Manufacturability through Design-Process Integration VII; 86840H (2013) https://doi.org/10.1117/12.2011450
Event: SPIE Advanced Lithography, 2013, San Jose, California, United States

Abstract

As the industry pushes to ever more complex illumination schemes to increase resolution for next generation memory and logic circuits; subresolution assist feature (SRAF) placement requirements become increasingly severe. Therefore device manufacturers are evaluating improvements in SRAF placement algorithms which do not sacrifice main feature (MF) patterning capability. AF placement algorithms can be categorized broadly as either rule-based (RB), model-based (MB). However, combining these different algorithms into new integrated solutions may enable a more optimal overall solution. RBAF is the baseline AF placement method for many previous technology nodes. Although RBAF algorithm complexity limits its use with very extreme illumination, RBAF is still a powerful option in certain scenarios. One example is for repeating patterns in memory arrays. RBAF algorithms can be finely optimized and verified experimentally without the building of complex models. RBAF also guarantees AF placement consistency based only on the very local geometric environment, which is important in applications where consistent signal propagation is of critical importance. MBAF algorithms deliver the ability to reliably place assist features for enhanced process window control across a wide variety of layout feature configurations and aggressive illumination sources. These methods optimize sophisticated AF placement to improve main feature PW but without performing full main feature OPC. The flexibility of MBAF allows for efficient investigations of future technology nodes as the number of interactions between local layout features increases beyond what RBAF algorithms can effectively support Based on hybrid approach algorithms combining features of the different algorithms using both RBAF and MBAF methods, the generation and placement of SRAF can be a good alternative. Combining of two kinds of SRAF placement options might result in relatively improved process window compared to an independent approach since two methods are capable of supplement each other with a complementary advantages. In this paper we evaluate the impact of SRAF configuration to pattern profile as well as CD margin window and manufacturing applications of MBAF and Hybrid approach algorithms compared to the current OPC without AF. As a conclusion, we suggest methodology to set up optimum SRAF configuration using these AF methods with regard to process window.

Citation Download Citation

Jinhyuck Jeon, Shinyoung Kim, Jookyoung Song, Chanha Park, Hyunjo Yang, Donggyu Yim, Brian Ward, Yunqiang Zhang, Kevin Hooker, Munhoe Do, Jung-Hoe Choi, and Stephen Jang "Process window analysis of algorithmic assist feature placement options at the 2X nm node DRAM", Proc. SPIE 8684, Design for Manufacturability through Design-Process Integration VII, 86840H (29 March 2013); https://doi.org/10.1117/12.2011450

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
12 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

SRAF

Atrial fibrillation

Critical dimension metrology

Optical proximity correction

Semiconducting wafers

Photomasks

Model-based design

Show All Keywords

Keywords/Phrases

Search In:

Publication Years