A novel algorithm for automatic arrays detection in a layout

Marwah Shafee; Jea-Woo Park; Ara Aslyan; Andres Torres; Kareem Madkour; Wael ElManhawy

doi:10.1117/12.2011413

29 March 2013 A novel algorithm for automatic arrays detection in a layout

Marwah Shafee, Jea-Woo Park, Ara Aslyan, Andres Torres, Kareem Madkour, Wael ElManhawy

Proceedings Volume 8684, Design for Manufacturability through Design-Process Integration VII; 86840O (2013) https://doi.org/10.1117/12.2011413
Event: SPIE Advanced Lithography, 2013, San Jose, California, United States

Abstract

Integrated circuits suffer from serious layout printability issues associated to the lithography manufacturing process. Regular layout designs are emerging as alternative solutions to help reducing these systematic sub-wavelength lithography variations. From CAD point of view, regular layouts can be treated as repeated patterns that are arranged in arrays. In most modern mask synthesis and verification tools, cell based hierarchical processing has been able to identify repeating cells by analyzing the design’s cell placement; however, there are some routing levels which are not inside the cell and yet they create an array-like structure because of the underlying topologies which could be exploited by detecting repeated patterns in layout thus reducing simulation run-time by simulating only the representing cells and then restore all the simulation results in their corresponding arrays. The challenge is to make the array detection and restoration of the results a very lightweight operation to fully realize the benefits of the approach. A novel methodology for detecting repeated patterns in a layout is proposed. The main idea is based on translating the layout patterns into string of symbols and construct a “Symbolic Layout”. By finding repetitions in the symbolic layout, repeated patterns in the drawn layout are detected. A flow for layout reduction based on arrays-detection followed by pattern-matching is discussed. Run time saving comes from doing all litho simulations on the base-patterns only. The pattern matching is then used to restore all the simulation results over the arrays. The proposed flow shows 1.4x to 2x run time enhancement over the regular litho simulation flow. An evaluation for the proposed flow in terms of coverage and run-time is drafted.

Citation Download Citation

Marwah Shafee, Jea-Woo Park, Ara Aslyan, Andres Torres, Kareem Madkour, and Wael ElManhawy "A novel algorithm for automatic arrays detection in a layout", Proc. SPIE 8684, Design for Manufacturability through Design-Process Integration VII, 86840O (29 March 2013); https://doi.org/10.1117/12.2011413

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available