STT MRAM patterning challenges

Werner Boullart; Dunja Radisic; Vasile Paraschiv; Sven Cornelissen; Mauricio Manfrini; Koichi Yatsuda; Eiichi Nishimura; Tetsuya Ohishi; Shigeru Tahara

doi:10.1117/12.2013602

29 March 2013 STT MRAM patterning challenges

Werner Boullart, Dunja Radisic , Vasile Paraschiv, Sven Cornelissen, Mauricio Manfrini, Koichi Yatsuda, Eiichi Nishimura, Tetsuya Ohishi, Shigeru Tahara

Author Affiliations +

Proceedings Volume 8685, Advanced Etch Technology for Nanopatterning II; 86850F (2013) https://doi.org/10.1117/12.2013602
Event: SPIE Advanced Lithography, 2013, San Jose, California, United States

Abstract

In this paper we report on the patterning challenges for the integration of Spin-Transfer Torque Magneto-Resistive- Random-Access Memory (STT MRAM). An overview of the different patterning approaches that have been evaluated in the past decade is presented. Plasma based etching, wet echting, but also none subtractive pattering approaches are covered. The paper also reports on the patterning strategies, currently under investigation at imec.

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Werner Boullart, Dunja Radisic , Vasile Paraschiv, Sven Cornelissen, Mauricio Manfrini, Koichi Yatsuda, Eiichi Nishimura, Tetsuya Ohishi, and Shigeru Tahara "STT MRAM patterning challenges", Proc. SPIE 8685, Advanced Etch Technology for Nanopatterning II, 86850F (29 March 2013); https://doi.org/10.1117/12.2013602

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