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8 January 2013 The effects of additive gases (Ar, N2, H2, Cl2, O2) on HCl plasma parameters and composition
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Proceedings Volume 8700, International Conference Micro- and Nano-Electronics 2012; 870003 (2013) https://doi.org/10.1117/12.2017138
Event: International Conference on Micro-and Nano-Electronics 2012, 2012, Zvenlgorod, Russian Federation
Abstract
The direct current (dc) glow discharge plasma parameters and active species kinetics in HCl-X (X = Ar, N2, H2, Cl2, O2) mixtures were studied using both plasma diagnostics Langmuir probes and modeling. The 0-dimensional self-consistent steady-state model included the simultaneous solution of Boltzmann kinetic equation, the equations of chemical kinetics for neutral and charge particles, plasma conductivity equation and the quasi-neutrality conditions for volume densities of charged particles as well as for their fluxes to the reactor walls. The data on the steady-state electron energy distribution function, electron gas characteristics (mean energy, drift rate and transport coefficients), volume-averaged densities of plasma active species and their fluxed to the reactor walls were obtained as functions of gas mixing ratios and gas pressure at fixed discharge current.
© (2013) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
A. Efremov, A. Yudina, A. Davlyatshina, D. Murin, and V. Svetsov "The effects of additive gases (Ar, N2, H2, Cl2, O2) on HCl plasma parameters and composition", Proc. SPIE 8700, International Conference Micro- and Nano-Electronics 2012, 870003 (8 January 2013); https://doi.org/10.1117/12.2017138
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