Projection exposure using a projector with highly minute liquid crystal display panels

Soichiro Koyama; Kenji Saito; Toshiyuki Horiuchi

doi:10.1117/12.2027570

28 June 2013 Projection exposure using a projector with highly minute liquid crystal display panels

Soichiro Koyama, Kenji Saito, Toshiyuki Horiuchi

Proceedings Volume 8701, Photomask and Next-Generation Lithography Mask Technology XX; 87010U (2013) https://doi.org/10.1117/12.2027570
Event: Photomask and NGL Mask Technology XX, 2013, Yokohama, Japan

Abstract

Projection lithography using a liquid crystal display panel in place of a reticle is expected as a low-cost reticleless patterning method. Here, a simple but useful new exposure system using a projector with highly minute liquid crystal display panels is proposed. A projector with a light source and red, green and blue liquid crystal display panels was used as it was, and a set of two commercial macro-lenses was attached as reduction projection optics. The exposure system was evaluated by printing various patterns. Positive OFPR-800 (Tokyo Ohka Kogyo) was used as a resist. The diameter of the exposure field was approximately 6 mm. As a result, line patterns with a minimum width of 14 μm were clearly resolved. However, noticeable partial exposure unevenness was observed for patterns with a width of 40 μm or less. Because applications using large patterns with widths of 100-200 μm are aimed at hand, it is not a problem, and patterns with such large sizes are sharply and homogeneously printed even if they are considerably complicated.

Citation Download Citation

Soichiro Koyama, Kenji Saito, and Toshiyuki Horiuchi "Projection exposure using a projector with highly minute liquid crystal display panels", Proc. SPIE 8701, Photomask and Next-Generation Lithography Mask Technology XX, 87010U (28 June 2013); https://doi.org/10.1117/12.2027570

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