A very fast and accurate rigorous EMF simulator for EUVL masks based on the pseudo-spectral time-domain method

Michael Yeung; Eytan Barouch

doi:10.1117/12.2027329

28 June 2013 A very fast and accurate rigorous EMF simulator for EUVL masks based on the pseudo-spectral time-domain method

Michael Yeung, Eytan Barouch

Author Affiliations +

Proceedings Volume 8701, Photomask and Next-Generation Lithography Mask Technology XX; 870113 (2013) https://doi.org/10.1117/12.2027329
Event: Photomask and NGL Mask Technology XX, 2013, Yokohama, Japan

Abstract

Computer simulation can be very useful for developing a better understanding of the printability of buried defects in EUVL masks. At present, the most widely used rigorous methods for this purpose are the finite-difference time-domain (FDTD) and the rigorous coupled wave analysis (RCWA) methods. However, both of these methods require huge computation resources to simulate large 3D EUVL masks accurately. In this paper, a new rigorous EMF simulator based on the pseudo-spectral time-domain (PSTD) method is discussed. PSTD is free from the grid-snapping and numerical-dispersion errors that plague FDTD and has an accuracy equal to that of RCWA. Also, PSTD requires relatively little computer memory and, furthermore, is well suited to parallization on both multi-core CPU and multi-GPU platforms.

Citation Download Citation

Michael Yeung and Eytan Barouch "A very fast and accurate rigorous EMF simulator for EUVL masks based on the pseudo-spectral time-domain method", Proc. SPIE 8701, Photomask and Next-Generation Lithography Mask Technology XX, 870113 (28 June 2013); https://doi.org/10.1117/12.2027329

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