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17 May 2013Microgalvanic nickel pulse plating process for the production of thermal actuators
Nickel is often used in the micro fabrication because of its fatigue resistance and its mechanical properties. It
is used for instance for thermal actuators, micro-grippers, or RF-switches. The defined electrodeposition of the
nickel matrix is crucial for the properties and functionality of the thermal actuators. Micro galvanic processes are
the basis of this electrodeposition, and require knowledge of the electrochemical fundamentals as well as numerical
electrochemical process simulation for adjustment. Especially realization of high aspect ratios requires the use
of sophisticated plating techniques such as pulse reverse deposition. The pulse plating process was adjusted by
using the results of electrochemical numerical simulation routines, visualizing the (local) potential field and the
current field line distribution as a function of the applied electrochemical parameters. Compact, completely void
free structures could be obtained applying the developed pulse plating process to the structured wafers. The
electrodeposited material has been nickel for stability and hardness reasons. MEMS structures were designed to
convert the thermal expansion of the material into an in-plane defection. A custom made measurement setup,
consisting of a sealable chamber, a Peltier element with a temperature control unit, and an optical microscope
is used to measure these defections at different temperatures. Additional, finite element simulations are carried
out to determine the thermal expansion coefficient of the plated Nickel.
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W. Hansal, H. Steiner, R. Mann, M. Halmdienst, J. Schalko, F. Keplinger, "Microgalvanic nickel pulse plating process for the production of thermal actuators," Proc. SPIE 8763, Smart Sensors, Actuators, and MEMS VI, 87632X (17 May 2013); https://doi.org/10.1117/12.2018001