Mechanism for 355 nm nanosecond-pulse-driven damage in HfO2/SiO2 high reflectivity coating

Zhenkun Yu; Hongbo He; Hongji Qi; Shunli Chen; Qiling Xiao

doi:10.1117/12.2020363

9 July 2013 Mechanism for 355 nm nanosecond-pulse-driven damage in HfO₂/SiO₂ high reflectivity coating

Zhenkun Yu, Hongbo He, Hongji Qi, Shunli Chen, Qiling Xiao

Proceedings Volume 8786, Pacific Rim Laser Damage 2013: Optical Materials for High Power Lasers; 878622 (2013) https://doi.org/10.1117/12.2020363
Event: SPIE/SIOM Pacific Rim Laser Damage: Optical Materials for High-Power Lasers, 2013, Shanghai, China

Abstract

The effect of oxygen vacancy on the laser-induced damage behaviors of HfO₂/SiO₂ high reflective coating was investigated by single 355nm-8ns laser. The oxygen vacancy was tuned by controlling the oxygenation of the outmost HfO₂ layer during the deposition procedure. The reflectivity of the coating with higher oxygen vacancy drops by 0.2% and the damage threshold drops by 60%, compared with the normal coating. Damage morphologies of samples were obtained by optical microscope, AFM, SEM and FIB technology. Typical morphologies of these coatings show little difference. Average oxygen vacancy of single HfO₂ layer prepared on the BK7 substrate measured by XPS is about 43%. Theoretical analysis with a nonlinear thermodynamics model shows that the damage can be attributed to nonlinear thermal process. Moreover, the size of damage crater can be interpreted by a mechanics model.

Citation Download Citation

Zhenkun Yu, Hongbo He, Hongji Qi, Shunli Chen, and Qiling Xiao "Mechanism for 355 nm nanosecond-pulse-driven damage in HfO₂/SiO₂ high reflectivity coating", Proc. SPIE 8786, Pacific Rim Laser Damage 2013: Optical Materials for High Power Lasers, 878622 (9 July 2013); https://doi.org/10.1117/12.2020363

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