Titanium dioxide fine structures by RF magnetron sputter method deposited on an electron-beam resist mask

Hideomi Hashiba; Yuta Miyazaki; Sachiko Matsushita

doi:10.1117/12.2024360

26 September 2013 Titanium dioxide fine structures by RF magnetron sputter method deposited on an electron-beam resist mask

Hideomi Hashiba, Yuta Miyazaki, Sachiko Matsushita

Author Affiliations +

Proceedings Volume 8816, Nanoengineering: Fabrication, Properties, Optics, and Devices X; 88161F (2013) https://doi.org/10.1117/12.2024360
Event: SPIE NanoScience + Engineering, 2013, San Diego, California, United States

Abstract

Titanium dioxide (TiO₂) has been draw attention for wide range of applications from photonic crystals for visible light range by its catalytic characteristics to tera-hertz range by its high refractive index. We present an experimental study of fabrication of fine structures of TiO₂ with a ZEP electron beam resist mask followed by Ti sputter deposition techniques. A TiO₂ thin layer of 150 nm thick was grown on an FTO glass substrate with a fine patterned ZEP resist mask by a conventional RF magnetron sputter method with Ti target. The deposition was carried out with argon-oxygen gases at a pressure of 5.0 x 10 ^-1 Pa in a chamber. During the deposition, ratio of Ar-O₂ gas was kept to the ratio of 2:1 and the deposition ratio was around 0.5 Å/s to ensure enough oxygen to form TiO₂ and low temperature to avoid deformation of fine pattern of the ZPU resist mask. Deposited TiO₂ layers are white-transparent, amorphous, and those roughnesses are around 7 nm. Fabricated TiO₂ PCs have wider TiO₂ slabs of 112 nm width leaving periodic 410 x 410 nm² air gaps. We also studied transformation of TiO₂ layers and TiO₂ fine structures by baking at 500 °C. XRD measurement for TiO₂ shows that the amorphous TiO2 transforms to rutile and anatase forms by the baking while keeping the same profile of the fine structures. Our fabrication method can be one of a promising technique to optic devices on researches and industrial area.

Citation Download Citation

Hideomi Hashiba, Yuta Miyazaki, and Sachiko Matsushita "Titanium dioxide fine structures by RF magnetron sputter method deposited on an electron-beam resist mask", Proc. SPIE 8816, Nanoengineering: Fabrication, Properties, Optics, and Devices X, 88161F (26 September 2013); https://doi.org/10.1117/12.2024360

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available