Paper
9 September 2013 Performance of an automatic algorithm for quantifying critical dimensions in actinic aerial images
Doug Uzzel, Mark Ma, Shad E. Hedges, Saghir Munir
Author Affiliations +
Abstract
This article presents results from an algorithm that can automatically quantify critical dimensions in images from Mask inspection tools with a very high level of accuracy. Using such an algorithm the inspection systems can be run with much tighter settings, resulting in more false defect detections that can then be filtered using the algorithm described here. Such a technique could potentially make the inspection system suitable for inspecting photo-masks beyond its practical limitation.
© (2013) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Doug Uzzel, Mark Ma, Shad E. Hedges, and Saghir Munir "Performance of an automatic algorithm for quantifying critical dimensions in actinic aerial images", Proc. SPIE 8880, Photomask Technology 2013, 88800B (9 September 2013); https://doi.org/10.1117/12.2027913
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KEYWORDS
Inspection

Cadmium

Photomasks

Argon

Opacity

Reticles

Critical dimension metrology

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