Investigation of EUVL reticle capping layer peeling under wet cleaning

Sherjang Singh; Davide Dattilo; Uwe Dietze; Arun John Kadaksham; Il-Yong Jang; Frank Goodwin

doi:10.1117/12.2031430

3 October 2013 Investigation of EUVL reticle capping layer peeling under wet cleaning

Sherjang Singh, Davide Dattilo, Uwe Dietze, Arun John Kadaksham, Il-Yong Jang, Frank Goodwin

Author Affiliations +

Proceedings Volume 8880, Photomask Technology 2013; 888010 (2013) https://doi.org/10.1117/12.2031430
Event: SPIE Photomask Technology, 2013, Monterey, California, United States

Abstract

In the absence of a pellicle, an EUVL reticle is expected to withstand up to 100 cleaning cycles. EUVL reticles constitute a complex multi-layer structure with extremely sensitive materials which are prone to damage during cleaning. The 2.5 nm thin Ru capping layer has been reported to be most sensitive to repeated cleaning, especially when exposed to aggressive dry etch or strip chemicals [1]. Such a Ru film exhibits multiple modes of failure under wet cleaning processes. In this study we investigated the Ru peeling effect. IR-induced thermo-stress in the multilayer and photochemical-induced radical attack on the surface are investigated as the two most dominant contributors to Ru damage in cleaning. Results of this investigation are presented and corrective actions are proposed.

Citation Download Citation

Sherjang Singh, Davide Dattilo, Uwe Dietze, Arun John Kadaksham, Il-Yong Jang, and Frank Goodwin "Investigation of EUVL reticle capping layer peeling under wet cleaning", Proc. SPIE 8880, Photomask Technology 2013, 888010 (3 October 2013); https://doi.org/10.1117/12.2031430

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