Mask automation: need a revolution in mask makers and equipment industry

Seong-yong Moon; Sang-yong Yu; Young-hwa Noh; Ki-jung Son; Hyun-Joo Lee; Han-Ku Cho

doi:10.1117/12.2025569

9 September 2013 Mask automation: need a revolution in mask makers and equipment industry

Seong-yong Moon, Sang-yong Yu, Young-hwa Noh, Ki-jung Son, Hyun-Joo Lee, Han-Ku Cho

Author Affiliations +

Proceedings Volume 8880, Photomask Technology 2013; 888016 (2013) https://doi.org/10.1117/12.2025569
Event: SPIE Photomask Technology, 2013, Monterey, California, United States

Abstract

As improving device integration for the next generation, high performance and cost down are also required accordingly in semiconductor business. Recently, significant efforts have been given on putting EUV technology into fabrication in order to improve device integration. At the same time, 450mm wafer manufacturing environment has been considered seriously in many ways in order to boost up the productivity. Accordingly, 9-inch mask has been discussed in mask fabrication business recently to support 450mm wafer manufacturing environment successfully. Although introducing 9-inch mask can be crucial for mask industry, multi-beam technology is also expected as another influential turning point to overcome currently the most critical issue in mask industry, electron beam writing time. No matter whether 9-inch mask or multi-beam technology will be employed or not, mask quality and productivity will be the key factors to survive from the device competition. In this paper, the level of facility automation in mask industry is diagnosed and analyzed and the automation guideline is suggested for the next generation.

Citation Download Citation

Seong-yong Moon, Sang-yong Yu, Young-hwa Noh, Ki-jung Son, Hyun-Joo Lee, and Han-Ku Cho "Mask automation: need a revolution in mask makers and equipment industry", Proc. SPIE 8880, Photomask Technology 2013, 888016 (9 September 2013); https://doi.org/10.1117/12.2025569

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