DSA template mask determination and cut redistribution for advanced 1D gridded design

Zigang Xiao; Yuelin Du; Martin D.F. Wong; Hongbo Zhang

doi:10.1117/12.2025688

9 September 2013 DSA template mask determination and cut redistribution for advanced 1D gridded design

Zigang Xiao, Yuelin Du, Martin D.F. Wong, Hongbo Zhang

Author Affiliations +

Proceedings Volume 8880, Photomask Technology 2013; 888017 (2013) https://doi.org/10.1117/12.2025688
Event: SPIE Photomask Technology, 2013, Monterey, California, United States

Abstract

Directed self-assembly (DSA) technology has already demonstrated its capability for isolated and grouped contact/via pattern for 1D gridded design. If we reverse the resist tune, this technique can also be used to implement the cut printing. However, for this purpose, we need to redistribe the cuts by extending the real wires to form the desired cut distribution for template mask making. Based on this assumption, we propose an algorithm to redistribute the original cuts such that they form groups of non-conflict DSA templates. Experimental results demonstrate that our method can effectively redistribute the cuts and improve the layout manufacturability.

Citation Download Citation

Zigang Xiao, Yuelin Du, Martin D.F. Wong, and Hongbo Zhang "DSA template mask determination and cut redistribution for advanced 1D gridded design", Proc. SPIE 8880, Photomask Technology 2013, 888017 (9 September 2013); https://doi.org/10.1117/12.2025688

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