SEM image quality enhancement technology for bright field mask

Naoki Fukuda; Yuta Chihara; Soichi Shida; Keisuke Ito

doi:10.1117/12.2029786

9 September 2013 SEM image quality enhancement technology for bright field mask

Naoki Fukuda, Yuta Chihara, Soichi Shida, Keisuke Ito

Author Affiliations +

Proceedings Volume 8880, Photomask Technology 2013; 88801C (2013) https://doi.org/10.1117/12.2029786
Event: SPIE Photomask Technology, 2013, Monterey, California, United States

Abstract

Bright-field photomasks are used to print small contact holes via ArF immersion multiple patterning lithography. There are some technical difficulties when small floating dots are to be measured by SEM tools because of a false imaging shadow. However, a new scan technology of Multi Vision Metrology SEM^TM E3630 presents a solution for this issue. The combination of new scan technology and the other MVM-SEM® functions can provide further extended applications with more accurate measurement results.

Citation Download Citation

Naoki Fukuda, Yuta Chihara, Soichi Shida, and Keisuke Ito "SEM image quality enhancement technology for bright field mask", Proc. SPIE 8880, Photomask Technology 2013, 88801C (9 September 2013); https://doi.org/10.1117/12.2029786

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