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9 September 2013 SEM image quality enhancement technology for bright field mask
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Abstract
Bright-field photomasks are used to print small contact holes via ArF immersion multiple patterning lithography. There are some technical difficulties when small floating dots are to be measured by SEM tools because of a false imaging shadow. However, a new scan technology of Multi Vision Metrology SEMTM E3630 presents a solution for this issue. The combination of new scan technology and the other MVM-SEM® functions can provide further extended applications with more accurate measurement results.
© (2013) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Naoki Fukuda, Yuta Chihara, Soichi Shida, and Keisuke Ito "SEM image quality enhancement technology for bright field mask", Proc. SPIE 8880, Photomask Technology 2013, 88801C (9 September 2013); https://doi.org/10.1117/12.2029786
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