Performance of the proof-of-concept multi-beam mask writer (MBMW POC)

Christof Klein; Hans Loeschner; Elmar Platzgummer

doi:10.1117/12.2030772

1 October 2013 Performance of the proof-of-concept multi-beam mask writer (MBMW POC)

Christof Klein, Hans Loeschner, Elmar Platzgummer

Proceedings Volume 8880, Photomask Technology 2013; 88801E (2013) https://doi.org/10.1117/12.2030772
Event: SPIE Photomask Technology, 2013, Monterey, California, United States

Abstract

Two proof-of-concept electron multi-beam mask writer tools (MBMW POC) have been realized,which are utilizing262,144 programmable beams of 20nm beam size and 50keV beam energy to pattern 6" mask blanks. Tool characterization details and test results are outlined. Especially,LMSIPRO4 measurements (after development inspection) of short term and long term stability of the 82μm x 82μm beam array field are discussed.Scale stability of the beam array field of 0.1nm per day is demonstrated.

Citation Download Citation

Christof Klein, Hans Loeschner, and Elmar Platzgummer "Performance of the proof-of-concept multi-beam mask writer (MBMW POC)", Proc. SPIE 8880, Photomask Technology 2013, 88801E (1 October 2013); https://doi.org/10.1117/12.2030772

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