OPC modeling using AFM CD measurement

Kyoil Koo; Gyengseop Kim; Sanghun Kim; Seunghune Yang; Sooryong Lee; Youngchang Kim; Jungdal Choi; Hokyu Kang

doi:10.1117/12.2025552

9 September 2013 OPC modeling using AFM CD measurement

Kyoil Koo, Gyengseop Kim, Sanghun Kim, Seunghune Yang, Sooryong Lee, Youngchang Kim, Jungdal Choi, Hokyu Kang

Author Affiliations +

Proceedings Volume 8880, Photomask Technology 2013; 88801Q (2013) https://doi.org/10.1117/12.2025552
Event: SPIE Photomask Technology, 2013, Monterey, California, United States

Abstract

Most important factors in OPC model building will be sampling data for model calibration. We will demonstrate that how CD-AFM data can be used in OPC modeling and will show possibility to get a more predictive model by using CD-AFM data.

Citation Download Citation

Kyoil Koo, Gyengseop Kim, Sanghun Kim, Seunghune Yang, Sooryong Lee, Youngchang Kim, Jungdal Choi, and Hokyu Kang "OPC modeling using AFM CD measurement", Proc. SPIE 8880, Photomask Technology 2013, 88801Q (9 September 2013); https://doi.org/10.1117/12.2025552

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