Novel fracturing algorithm to reduce shot count for curvy shape

Takuya Tao; Nobuyasu Takahashi; Masakazu Hamaji

doi:10.1117/12.2030796

9 September 2013 Novel fracturing algorithm to reduce shot count for curvy shape

Takuya Tao, Nobuyasu Takahashi, Masakazu Hamaji

Author Affiliations +

Proceedings Volume 8880, Photomask Technology 2013; 88802J (2013) https://doi.org/10.1117/12.2030796
Event: SPIE Photomask Technology, 2013, Monterey, California, United States

Abstract

The increasing complexity of RET solutions has increased the shot count for advanced photomasks. In particular, the introduction of the inverse lithography technique (ILT) brings a significant increase in mask complexity and conventional fracturing algorithms generate much more shots because they are not optimized for curvilinear shapes. Several methods have been proposed to reduce shot count for ILT photomasks. One of the stronger approaches is the model-based fracturing, which utilizes precise dose control, shot overlaps and many other techniques. However, it requires much more computation resource and upgrades to the EB mask writer to support user-level dose modulation and shot overlaps. The algorithm proposed here is not model-based but based on geometry processing, the combination of shape extraction and direct manhattanization. Because it is not based on physical simulation, its processing speed is as fast as a conventional fracturing algorithm. It can generate both non-overlapping shots and overlapping shots and does not require user-level dose modulation. As the result, it can be utilized for the current standard VSB mask writers.

Citation Download Citation

Takuya Tao, Nobuyasu Takahashi, and Masakazu Hamaji "Novel fracturing algorithm to reduce shot count for curvy shape", Proc. SPIE 8880, Photomask Technology 2013, 88802J (9 September 2013); https://doi.org/10.1117/12.2030796

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