Development of high resistant anti-reflection coating by using Al2O3/SiO2 multilayer

Yoshihiro Ochi; Keisuke Nagashima; Hajime Okada; Momoko Tanaka; Ryo Tateno; Yasuyuki Furukawa; Akira Sugiyama

doi:10.1117/12.2030096

14 November 2013 Development of high resistant anti-reflection coating by using Al₂O₃/SiO₂ multilayer

Yoshihiro Ochi, Keisuke Nagashima, Hajime Okada, Momoko Tanaka, Ryo Tateno, Yasuyuki Furukawa, Akira Sugiyama

Proceedings Volume 8885, Laser-Induced Damage in Optical Materials: 2013; 88851Z (2013) https://doi.org/10.1117/12.2030096
Event: SPIE Laser Damage, 2013, Boulder, Colorado, United States

Abstract

We developed high-resistant anti-reflection (AR) coating by using Al₂O₃/SiO₂ multilayer for Yb:YAG thin disk amplifier. The AR coating was designed both for 940 nm of pump laser at an incident angle of 30 degrees and for 1030 nm of seed laser at 5 degrees. The Al₂O₃/SiO₂ multilayer was deposited by using the electron beam evaporation technique on a fused silica substrate and then the laser induced damage threshold was evaluated. The sample was irradiated by 1030 nm laser with 520 ps duration delivered from the Yb:YAG thin-disk regenerative amplifier. The measured damage threshold of the Al₂O₃/SiO₂ AR coating was 75 J/cm².

Citation Download Citation

Yoshihiro Ochi, Keisuke Nagashima, Hajime Okada, Momoko Tanaka, Ryo Tateno, Yasuyuki Furukawa, and Akira Sugiyama "Development of high resistant anti-reflection coating by using Al₂O₃/SiO₂ multilayer", Proc. SPIE 8885, Laser-Induced Damage in Optical Materials: 2013, 88851Z (14 November 2013); https://doi.org/10.1117/12.2030096

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