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1 October 2013 Status of the AIMS EUV development project
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Proceedings Volume 8886, 29th European Mask and Lithography Conference; 88860I (2013) https://doi.org/10.1117/12.2031611
Event: 29th European Mask and Lithography Conference, 2013, Dresden, Germany
Abstract
The need for an actinic wavelength AIMS™ EUV tool by 2014 has been defined by SEMATECH due to the challenges associated with EUV mask manufacture and defectivity. The AIMS™ EUV development project began in June of 2011 as a collaboration between ZEISS and the SEMATECH EUVL Mask Infrastructure (EMI) consortium. The project remains on track to meet the first commercial tool shipment in September 2014. The current design status of the system after two years as well as recent progress in the prototype build will be presented.
© (2013) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Anthony Garetto, Jan Hendrik Peters, Dirk Hellweg, and Markus Weiss "Status of the AIMS EUV development project", Proc. SPIE 8886, 29th European Mask and Lithography Conference, 88860I (1 October 2013); https://doi.org/10.1117/12.2031611
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